| 1. | Tinipd shape memory alloy films made by vacuum evaporation
形状记忆合金薄膜研究 |
| 2. | Electrical properties of si1 - x - ygexcy alloy films
合金薄膜电学性能的研究 |
| 3. | Progress in research on shape memory alloy films in mems field
磁场诱导有序排列和自组装的研究进展 |
| 4. | Advances of investigation on tini - based shape memory alloy films
领域中形状记忆合金薄膜的研究与进展 |
| 5. | Aluminum alloy films and sputtering targets for semiconductor integrated circuit wiring and electrodes
集成电路电极布线用铝合金薄膜及其溅射靶材 |
| 6. | X - ray diffraction ( xrd ) , reflection spectroscopy and photoluminescence spectroscopy were employed to study the optical properties of zno films and mgxzn1 - xo alloy films . the relationship between the optical properties and the crystallinity was discussed
并采用x射线衍射谱、反射谱和光致发光谱、低温光致发光谱等测量手段对样品的结构和光学特性进行了表征。 |
| 7. | The experimental results show that the quality of zno films prepared by electron beam evaporation can be greatly improved by means of two - step annealing of metallic zn films in oxygen ambient , and it is feasible to fabricate high quality mgxzn1 - xo alloy films with mgo buffer layers by using thermal evaporation technique following by two - step annealing process . this method gives a new path to prepare mgxzn1 - xo alloy films
实验结果表明利用电子束蒸发技术制备的zno薄膜材料，在经过氧气气氛下的二次退火处理后，能够表现出较好的发光和结构特性；以mgo薄膜作为缓冲层制备出了高质量的mgzno合金薄膜材料，这为开展mgzno合金薄膜材料的研究开辟了新的途径。 |
| 8. | In this dissertation , nanometer zno thin films on si ( 100 ) substrates were prepared by using thermal evaporation technique following by two - step annealing process : high quality zno thin films and mgxzn1 - xo alloy films have been grown on si ( 100 ) substrates with mgo buffer layers by using thermal evaporation technique following by two - step annealing process
本文介绍了采用电子束蒸发方法在si补底上制备出了高纯度的金属锌膜，然后通过二次退火得到了具有六角结构的高质量氧化锌多晶薄膜材料，另外，还采用电子束蒸发mgo薄膜作为缓冲层二次退火金属锌膜的方法制备出了高质量氧化锌多晶薄膜材料和mgzno合金薄膜材料。 |
| 9. | The gmr effect has became a international researching hotspot after the discovery of gmr effect of fe / cr multilayers . people found that multilayers formed by ferromagnetic metal of transition family and nonmagnetic metal or by alloy film and nonmagnetic metal will take on gmr effect . the value of gmr of co / cu multilayers is the biggest which can reach 65 % under room temperature
继fe / cr多层膜巨磁电阻效应发现以后，巨磁电阻效应已成为国际研究的热点，人们发现过渡族铁磁金属或合金薄膜与非磁性金属构成多层膜后均可呈现巨磁电阻效应，其中以co / cu多层膜的gmr值最高，室温巨磁电阻效应可达65 % 。 |
| 10. | Compared with different inducing methods by lots of experiments , a simple and effective inducing method is confirmed , the opimal technological conditions and formula about the soluton of electroless deposition ni - p alloy are also obtaned . the influence of different technological parameters on the deposition rate is studied . analyzed the pefformance of ni - p alloy on the differen substfates and its corresponding tricture , the result is shown tha the electroless plating nickel process can obtained the ni - p alloy film having brightuess - integrity sdse , strong binding energy and high rigidity at the temperatur about 350wt00oc , the electroless plating nickel film would trallsform from amorphous to crystal state
本文通过大量实验，对几种诱发材料与过程进行分析，研究确定了简便有效的诱发方法，以及与之相匹配的化学镀ni - p合金溶液优化配方和工艺条件，讨论了各工艺参数对镀速的影响，并对铜及黄铜基体上得到的ni - p沉积层进行了性能和结构分析，得到外观光亮完整、结合力强、硬度高的镀层。 |
